Self-assembly of block copolymers on topographically patterned polymeric substrates [electronic resource]

Imprint
Washington, D.C. : United States. Dept. of Energy. ; Oak Ridge, Tenn. : distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy, 2016
Physical description
1 online resource.

Online

Available online

Description

Contents/Summary

Summary
Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.

Subjects

Subjects
Materials Science.

Bibliographic information

Publication date
2016
Note
Published through SciTech Connect.
05/10/2016.
"9,335,629"
"13/546,378"
Xu, Ting; Russell, Thomas P.; Park, Soojin; Lee, Dong Hyun.
Funding information
FG02-96ER45612
Librarian view | Catkey: 11711877