The effects of plasma nitriding pretreatment in steel substrates on the photocatalytic activity of TiO2 films
Best source
All available sources
- Authors:
- IRALA, D. R
FONTANA, L. C
SAGAS, J. C
MACIEL, H. S - Author Affiliations:
- Technological Institute of Aeronautics, Plasmas & Processes Laboratory, 12228-900, S.J. dos Campos, Brazil
University Center - Catholic of Santa Catarina, 89203-005, Joinville, Brazil
Santa Catarina State University, Plasma Physics Laboratory, 89223-100, Joinville, Brazil
University of Paraiba Valley, Institute of Research and Development, 12244-000, S.J. dos Campos, Brazil - Source:
- Surface & coatings technology. 240:154-159
- Publication Date:
- 2014-01-01
- Language:
- English
- Abstract:
- This paper presents a comparative study of TiO2 films deposited on plasma nitrided and non-nitrided carbon steel substrates. It is well known that plasma nitriding contributes to increase film adhesion and corrosion resistance of the substrate. However, most studies about photocatalytic properties of TiO2 on steel substrates do not address the use of nitrided carbon steel. The main goal of this paper is to investigate the deposition of photocatalytic TiO2 film on nitrided carbon steel, obtained through a duplex treatment of plasma nitriding and reactive plasma sputtering deposition. TiO2 films were deposited on nitrided and non-nitrided AISI 1015 steel samples. The samples were characterized by X-ray diffraction (XRD), profilometry, scanning electron microscopy (SEM) and atomic force microscopy (AFM). The photocatalytic activity was evaluated by monitoring the effect of photoinduced hydrophilicity and through the degradation of methylene blue dye (MB). The pretreatment by plasma nitriding increases the substrate surface roughness and improves the growth of rutile phase. The roughness of the substrate surface affects wettability only when the TiO2 film is not photoactivated. All samples become super-hydrophilic upon UV irradiation and remaining in this state for at least 24 h. A slightly higher performance in photocatalysis of MB is obtained by TiO2 film deposited on non-nitrided substrate.
- Notes:
- Metals. Metallurgy<br><br>Physics and materials science
- Subjects:
- General chemistry, physical chemistry
Chimie générale, chimie physique
Metallurgy, welding
Métallurgie, soudage
Sciences exactes et technologie
Exact sciences and technology
Physique
Physics
Domaines interdisciplinaires: science des materiaux; rheologie
Cross-disciplinary physics: materials science; rheology
Science des matériaux
Materials science
Méthodes de dépôt de films et de revêtements; croissance de films et épitaxie
Methods of deposition of films and coatings; film growth and epitaxy
Traitements de surface
Surface treatments
Sciences appliquees
Applied sciences
Metaux. Metallurgie
Metals. Metallurgy
Transformation de matériaux métalliques
Production techniques
Traitements thermiques
Heat treatment
Traitements thermochimiques et traitements par diffusion
Thermochemical treatment and diffusion treatment
Surface treatment
Acier non allié
Carbon steels
Activité catalytique
Catalyst activity
Actividad catalítica
Couche mince
Thin films
Dépôt physique phase vapeur
Physical vapor deposition
Magnétron
Magnetrons
Nitruration
Nitridation
Oxyde de titane
Titanium oxide
Titanio óxido
Titanoxid
Plasma
Prétraitement
Pretreatment
Pretratamiento
Pulvérisation irradiation
Sputtering
Traitement surface
Surface treatments
Traitement thermochimique
Thermochemical treatment
Tratamiento termoquímico
Thermochemische Behandlung
Carbon steel
Magnetron sputtering
Photocatalysis
Plasma nitriding
TiO2 - Format:
- Academic Journal
- Database:
- PASCAL Archive
- Journal:
- Surface & coatings technology
- Volume:
- 240
- Page Start:
- 154
- Page Count:
- 6
- ISSN:
- 02578972
- Publisher:
- Amsterdam: Elsevier, 2014.
- Document Type:
- Article
- Physical Description:
- print, 38 ref
