1.3.1 Electromagnetic phenomena in plasma188.8.131.52 Conservation law for electric charge and current: electromagnetic waves; 184.108.40.206 Electromagnetic wave propagation; 220.127.116.11.1 Propagation in a media with high conductivity (i.e., metal); 18.104.22.168.2 Propagation in a media with low conductivity (i.e. dielectric); 1.3.2 Waves in plasma; 1.3.3 Plasma oscillations; 1.3.4 Electron plasma wave; 1.3.5 Sound waves in plasma; 1.3.6 Waves in plasma with magnetic field; 1.3.7 Plasma instabilities; 22.214.171.124 Two-stream instability; 126.96.36.199 Kinetic instabilities; 1.4 Plasma-wall interactions.
1.4.1 Plasma-wall transition: electrostatic phenomena188.8.131.52 Condition for stable sheath: Bohm criterion; 184.108.40.206 Monotonic solution for sheath-presheath region; 220.127.116.11 Mathematical formulation; 18.104.22.168.1 Presheath (quasi-neutral region, ne=ni); 22.214.171.124.2 Sheath; 126.96.36.199.3 Direct numerical solution of the sheath-presheath regions; 188.8.131.52 Monotonic potential distribution in the sheath; 184.108.40.206 Solutions in plasma and sheath regions: procedure of patching; 220.127.116.11 Typical electrostatic sheath; 18.104.22.168.1 Child-Langmuir sheath; 22.214.171.124.2 Sheath at floating wall.
126.96.36.199.3 Sheath with arbitrary ion distribution function: kinetic approach188.8.131.52.4 Sheath with secondary electron emission (SEE); 184.108.40.206 Sheath in a magnetic field; 1.5 Surface phenomena: electron emission and vaporization; 1.5.1 Electron emission; 220.127.116.11 Thermionic emission; 18.104.22.168 Field emission; 22.214.171.124 T-F emission; 126.96.36.199 Secondary electron emission; 1.5.2 Vaporization; 188.8.131.52 Langmuir model; 184.108.40.206 Kinetic models; 220.127.116.11 Model of the nonequilibrium layer; 18.104.22.168.1 DSMC particle approach; 22.214.171.124.2 Analytical approach; 126.96.36.199.3 Examples of Knudsen layer calculation.
188.8.131.52.4 Ablation of the Teflon into discharge plasma184.108.40.206.5 Outlook on evaporation analysis approached; Homework problems; Section 1; Section 2; Section 3; Section 4; Section 5; References; 2 Plasma Diagnostics; 2.1 Langmuir probes; 2.2 Orbital motion limit; 2.3 Langmuir probes in collisional-dominated regime; 2.4 Emissive probe; 2.5 Probe in magnetic field; 2.6 Ion energy measurements: electrostatic analyzer; 2.7 HF cutoff plasma diagnostics; 2.8 Interferometric technique; 2.9 Optical measurements and fast imaging; 2.10 Plasma spectroscopy; 2.11 Microwave scattering; Homework problems.
Plasma engineering applies the unique properties of plasmas (ionized gases) to improve processes and performance over many fields such as materials processing, spacecraft propulsion, and nanofabrication. This textbook covers the fundamentals of plasma physics at a level suitable for an upper level undergraduate or graduate student, then goes on to provide the widest variety of applications of any text on the market, spanning the areas of aerospace engineering, nanotechnology, and nano-bioengineering. This is the first textbook that addresses plas.