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Plasma Engineering [electronic resource] : Applications from Aerospace to Bio and Nanotechnology.

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Author/Creator:
Keidar, Michael.
Language:
English.
Publication date:
2013
Imprint:
San Diego : Elsevier Science, 2013.
Format:
  • Book
  • 1 online resource (442 p.)
Bibliography:
References. Includes bibliographical references.
Contents:
  • Front Cover; Plasma Engineering; Copyright Page; Contents; Preface; 1 Plasma Concepts; 1.1 Introduction; 1.1.1 Debye length; 1.1.2 Plasma oscillation; 1.1.3 Plasma types; 1.1.3.1 Thermonuclear fusion; 1.1.3.2 Vacuum arcs; 1.1.3.3 Cold plasma; 1.1.3.4 Plasma in nature; 1.2 Plasma particle phenomena; 1.2.1 Particle collisions; 1.2.1.1 Definitions; 1.2.1.2 Cross section: mean free path; 1.2.1.3 Charge-exchange cross section; 1.2.1.4 Coulomb collision cross section; 1.2.1.5 Ionization cross section; 1.2.1.6 Plasma equilibrium; 1.3 Waves and instabilities in plasmas.
  • 1.3.1 Electromagnetic phenomena in plasma1.3.1.1 Conservation law for electric charge and current: electromagnetic waves; 1.3.1.2 Electromagnetic wave propagation; 1.3.1.2.1 Propagation in a media with high conductivity (i.e., metal); 1.3.1.2.2 Propagation in a media with low conductivity (i.e. dielectric); 1.3.2 Waves in plasma; 1.3.3 Plasma oscillations; 1.3.4 Electron plasma wave; 1.3.5 Sound waves in plasma; 1.3.6 Waves in plasma with magnetic field; 1.3.7 Plasma instabilities; 1.3.7.1 Two-stream instability; 1.3.7.2 Kinetic instabilities; 1.4 Plasma-wall interactions.
  • 1.4.1 Plasma-wall transition: electrostatic phenomena1.4.1.1 Condition for stable sheath: Bohm criterion; 1.4.1.2 Monotonic solution for sheath-presheath region; 1.4.1.3 Mathematical formulation; 1.4.1.3.1 Presheath (quasi-neutral region, ne=ni); 1.4.1.3.2 Sheath; 1.4.1.3.3 Direct numerical solution of the sheath-presheath regions; 1.4.1.4 Monotonic potential distribution in the sheath; 1.4.1.5 Solutions in plasma and sheath regions: procedure of patching; 1.4.1.6 Typical electrostatic sheath; 1.4.1.6.1 Child-Langmuir sheath; 1.4.1.6.2 Sheath at floating wall.
  • 1.4.1.6.3 Sheath with arbitrary ion distribution function: kinetic approach1.4.1.6.4 Sheath with secondary electron emission (SEE); 1.4.1.7 Sheath in a magnetic field; 1.5 Surface phenomena: electron emission and vaporization; 1.5.1 Electron emission; 1.5.1.1 Thermionic emission; 1.5.1.2 Field emission; 1.5.1.3 T-F emission; 1.5.1.4 Secondary electron emission; 1.5.2 Vaporization; 1.5.2.1 Langmuir model; 1.5.2.2 Kinetic models; 1.5.2.3 Model of the nonequilibrium layer; 1.5.2.3.1 DSMC particle approach; 1.5.2.3.2 Analytical approach; 1.5.2.3.3 Examples of Knudsen layer calculation.
  • 1.5.2.3.4 Ablation of the Teflon into discharge plasma1.5.2.3.5 Outlook on evaporation analysis approached; Homework problems; Section 1; Section 2; Section 3; Section 4; Section 5; References; 2 Plasma Diagnostics; 2.1 Langmuir probes; 2.2 Orbital motion limit; 2.3 Langmuir probes in collisional-dominated regime; 2.4 Emissive probe; 2.5 Probe in magnetic field; 2.6 Ion energy measurements: electrostatic analyzer; 2.7 HF cutoff plasma diagnostics; 2.8 Interferometric technique; 2.9 Optical measurements and fast imaging; 2.10 Plasma spectroscopy; 2.11 Microwave scattering; Homework problems.
Summary:
Plasma engineering applies the unique properties of plasmas (ionized gases) to improve processes and performance over many fields such as materials processing, spacecraft propulsion, and nanofabrication. This textbook covers the fundamentals of plasma physics at a level suitable for an upper level undergraduate or graduate student, then goes on to provide the widest variety of applications of any text on the market, spanning the areas of aerospace engineering, nanotechnology, and nano-bioengineering. This is the first textbook that addresses plas.
Contributor:
Beilis, Isak.
Available in another form:
Print version: Keidar, Michael Plasma Engineering : Applications from Aerospace to Bio and Nanotechnology San Diego : Elsevier Science, c2013 9780123859778
Subjects:
ISBN:
9780123859785
0123859786

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